NSN 5961-01-328-9034 01-328-9034, 013289034
Product Details | DIODE SEMICONDUCTOR DEVICE
5961-01-328-9034 A two electrode semiconductor device having an asymmetrical voltage - current characteristic. May or may not include mounting hardware and/or heatsink. Excludes LIGHT EMITTING DIODE and SEMICONDUCTOR DEVICE,PHOTO. For items containing material such as selenium and copper oxide, see RECIFIER, METALLIC.
Part Alternates: 5961-01-328-9034, 01-328-9034, 5961013289034, 013289034
Electrical and Electronic Equipment Components | Semiconductor Devices and Associated Hardware
| Supply Group (FSG) | NSN Assign. | NIIN | Item Name Code (INC) |
|---|---|---|---|
| 59 | 01-328-9034 | 20589 ( SEMICONDUCTOR DEVICE, DIODE ) |
Cross Reference | NSN 5961-01-328-9034
| Part Number | Cage Code | Manufacturer |
|---|---|---|
| 7906424-59 | 90536 | LOCKHEED MARTIN CORPORATION DBA LOCKHEED MARTIN |
| 8507001-149 | 07187 | HONEYWELL INTERNATIONAL INC. DBA HONEYWELL |
| 934A775-2 | 99167 | HAMILTON SUNDSTRAND CORPORATION |
| JANTX1N4469 | 81349 | MILITARY SPECIFICATIONS PROMULGATED BY MILITARY |
| JANTXV1N4469 | 12969 | MICRO USPD INC |
| JANTXV1N4469 | 81349 | MILITARY SPECIFICATIONS PROMULGATED BY MILITARY |
| L-41-1547-509 | K6894 | BAE SYSTEMS RO DEFENCE |
| MIL-PRF-19500/406 | 81349 | MILITARY SPECIFICATIONS PROMULGATED BY MILITARY |
| P15565-8 | 07639 | GE AVIATION SYSTEMS LLC DBA GE AVIATION |
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Technical Data | NSN 5961-01-328-9034
| Characteristic | Specifications |
|---|---|
| SEMICONDUCTOR MATERIAL | SILICON |
| INCLOSURE MATERIAL | GLASS |
| OVERALL LENGTH | 0.160 INCHES MAXIMUM |
| OVERALL DIAMETER | 0.050 INCHES MAXIMUM |
| MANUFACTURERS CODE | 07187 |
| DESIGN CONTROL REFERENCE | 8507001-149 |
Restrictions/Controls & Freight Information | NSN 5961-01-328-9034
| Category | Code | Description |
|---|---|---|
| Hazardous Material Indicator Code | N | There is no data in the HMIS and the NSN is in an FSC not generally suspected of containing hazardous materials |
| Category | Code | Description |
|---|---|---|
| No Freight Information | ||